Via Size-Dependent Properties of TiAl Ohmic Contacts on 4H-SiC

نویسندگان

چکیده

P-type Ti/Al-based contact vias of different sizes but identical processing were electrically characterized using linear transfer length method (TLM) patterns and metal-oxide-semiconductor (MOS) transistors. While the TLM MOS transistors with large follow ohmic behavior, Schottky properties observed for smaller via dimensions. Focused ion beam (FIB) analysis verified presence Ti 3 SiC 2 on 66 μm x 25 its absence 16 ones, correlating electrical properties.

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ژورنال

عنوان ژورنال: Materials Science Forum

سال: 2022

ISSN: ['1422-6375', '0250-9776', '0255-5476', '1662-9752', '1662-9760']

DOI: https://doi.org/10.4028/p-36s1w4